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为了研究非平衡磁控溅射沉积系统的等离子体特性 ,采用常规磁控溅射靶和同轴约束磁场构成非平衡磁控溅射沉积系统 .在放电空间不同的轴向位置 ,Ar放电 ,0 2Pa和 15 0V偏压条件下 ,采用圆形平面离子收集电极 ,测量不同约束磁场条件下的饱和离子束流密度 .研究结果表明 ,在同轴磁场作用下 ,收集电极的离子束流密度能达到饱和值 9mA cm2 左右 ,有利于在沉积薄膜的过程中产生离子轰击效应 .根据磁流体理论分析了同轴约束磁场形成的磁镜效应和对放电过程的影响机理 .实验与模型计算结果的比较表明 ,模型从理论上表达了同轴磁场约束对非平衡磁控溅射等离子体特性的影响规律 .
In order to study the plasma characteristics of the unbalanced magnetron sputtering deposition system, a conventional magnetron sputtering target and a coaxial confining magnetic field are used to form an unbalanced magnetron sputtering deposition system. In different axial positions of the discharge space, Ar discharges, 0 2Pa and 150V bias conditions, the circular planar ion-collecting electrode was used to measure the saturation ion beam current under different confinement magnetic field conditions.The results show that the ion beam current density of the collecting electrode under the coaxial magnetic field can reach Saturation of about 9mA cm2, which is conducive to the ion bombardment effect during the deposition of thin films.According to the theory of magnetic fluid, the magnetic mirror effect and the influence mechanism of the magnetic field on the discharge process are analyzed.The comparison between the experiment and the model shows The model theoretically expresses the influence of the coaxial magnetic confinement on the characteristics of unbalanced magnetron sputtering plasma.