ZnO homojunction light-emitting diodes are fabricated on Si(100) substrates by plasma assisted metal organic chemical vapour deposition, A p-type layer of nitrogen-doped ZnO film is formed using radical N2O as the acceptor precursor.The n-type ZnO layer is composed of un-doped ZnO film.The device exhibits desirable rectifying behaviour with a tu-on voltage of 3.3 V and a reverse breakdown voltage higher than 6 V.Distinct electroluminescence emissions centred at 395nm and 49Ohm are detected from this device at forvcard current higher than 20mA at room temperature.