采用直流磁控溅射法研究了磁控溅射沉积氮化铁薄膜的生长机制 ,并归属了其生长普适类型 .结果表明 ,磁控溅射法生长的薄膜表面具有自仿射分形特性 ,而且表面存在一定数量的空位或孔洞 ,粒子呈现悬臂沉积生长现象 .γ′-Fe4 N单相薄膜的生长指数 β≈ 0 .61± 0 .0 2 ,静态标度指数 α≈ 0 .5 7± 0 .2 0 ,各指数之间的关系为 α+α/ β≈ 2 ,薄膜生长属于 KPZ普适类型 The growth mechanism of magnetron sputtering deposited iron nitride thin films was studied by direct current magnetron sputtering method and belonged to the general type of growth.The results show that the film surface grown by magnetron sputtering has self-affine fractal characteristics, And there are a certain number of vacancies or holes on the surface, the particles showed cantilever deposition growth.γ’-Fe4N single-phase film growth index β ≈ 0.61 ± 0 .0 2, the static scale index α ≈ 0.57 ± 0 .2 0, the relationship between the index α + α / β ≈ 2, the film growth belongs to the KPZ universal type