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为实现对聚合膜结构、性能的优化控制，通过测量苯乙烯等离子体辉光区和两极板鞘层区内的发射光谱，得到了ＣＨ、Ｃ４Ｈ２＋粒子发射强度与放电气压、功率的变化关系曲线，并以此研究了等离子体内部过程与膜结构、沉积速率之间的关系。研究结果表明，等离子体聚苯乙烯薄膜的沉积速率取决于等离子体中所产生的各种活性粒子（包括激发态分子、碎片自由基、离子等）的总数目；而聚合膜中的苯环含量，则与气相中含有苯环基团的那部分活性粒子数目相关。
In order to optimize the structure and performance of the polymer films, the emission intensity curves of CH, C4H2 + particles with discharge pressure and power were obtained by measuring the emission spectra in the glow region of styrene plasma and sheath region. The relationship between plasma internal process and membrane structure and deposition rate was studied. The results show that the deposition rate of the plasma polystyrene film depends on the total number of various active particles (including excited state molecules, fragment free radicals, ions, etc.) generated in the plasma; while the content of benzene ring , It is related to the number of active particles that contain benzene ring groups in the gas phase.