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本文提出的一种纹膜结构单硅片微麦克风，采用了硅微机械技术，且实现了麦克风电容两电极之间的自对准，大大提高了麦克风的生产效率，降低了成本．纹膜结构有降低和消除膜内应力的作用，而纹膜的三维结构使麦克风电容的有效面积有所增加，这些都显著地提高了麦克风的灵敏度，是该项新结构的关键．本文从理论和实验上对纹膜结构机械性能与结构尺寸参数之间的关系，及结构的优化进行了研究．通过对制作出的不同结构参数ｑ值的麦克风的测试，得到了与初步理论分析基本相符的实验结果．实验证明，纹膜结构具有比相应的平膜结构高得多的机械灵敏度和麦克风灵敏度，是一种硅麦克风走向实用化的很有效的结构．
In this paper, a monolayer micro-microphone with monolayer structure is proposed, which adopts silicon micromachining technology and realizes the self-alignment between the two electrodes of the microphone capacitor, which greatly improves the production efficiency of the microphone and reduces the cost. The structure of the film has the effect of reducing and eliminating stress in the film, and the three-dimensional structure of the film increases the effective area of the microphone capacitor, which significantly improves the sensitivity of the microphone and is the key to the new structure. In this paper, the relationship between the mechanical properties of the film structure and the parameters of the structure and the optimization of the structure are studied theoretically and experimentally. By testing the microphones with different values of the structure parameter q, the experimental results basically consistent with the preliminary theoretical analysis are obtained. Experiments show that the structure of the film has much higher mechanical sensitivity and microphone sensitivity than the corresponding flat film structure and is a very effective structure for the practical application of the silicon microphone.