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介绍了纳米几何量量值传递中纳米标准样版的计量与溯源特性。分析了微纳米测量仪器在纳米标准样版几何参量校准中对标准样版循迹结构的具体需求。设计了标准值为60 nm,具有可循迹结构的纳米台阶标准样版。为了实现高精度、溯源性表征,基于计量型纳米测量仪(NMM),结合多种定位测量方法,对加工的纳米台阶标准样版进行测量与评价,并对其开展区域均匀性和长时间稳定性实验。实验结果表明,制备的台阶标准样版高度值与设计值基本一致,设计的循迹结构能有效地协助电荷耦合器件(CCD)实现快速循迹与定位,且采用溅射镀膜工艺优化了标准样版表面结构的特性,使多种定位测量方法的测量重复性标准偏差均小于1 nm。
The metrological and traceability characteristics of nanometer standard sample in the delivery of nano-geometry are introduced. The specific requirements of the standard sample plate tracking structure in the calibration of nano-standard sample geometrical parameters are analyzed. A standard nano-scale pattern with a traceable structure of 60 nm was designed. In order to achieve high-precision and traceability characterization, based on metrological nano-meter (NMM), combined with a variety of positioning measurement methods, the processed nano-step standard sample plate was measured and evaluated, and its regional uniformity and long-term stability Sexual experiment. The experimental results show that the height value of the prepared standard sample plate is basically consistent with the designed value. The designed tracking structure can effectively assist the CCD (Charge Coupled Device) to achieve fast tracking and positioning, and the sputter coating process can optimize the standard sample The characteristics of the surface structure of the plate make the measurement repeatability standard deviation of many kinds of positioning measurement methods less than 1 nm.