用脉冲激光沉积法在MgO(100)衬底上沉积了ZnO薄膜.衬底温度分别为400℃、550℃和700℃.利用X射线衍射(XRD)和光致发光谱(PL)对薄膜的结构和光学性能进行研究.X射线衍射的结果表明,在400℃和550℃下生长的ZnO薄膜具有高度c-轴择优取向,但是当衬底温度升高到700℃时,薄膜由单一的择优取向变为有两个较强的择优取向.通过光致发光谱可以发现,在550℃下生长的ZnO薄膜具有强的紫外发射和窄的FWHM,并且紫外发光峰的强度与ZnO薄膜的结晶质量密切相关. ZnO thin films were deposited on MgO (100) substrates by pulsed laser deposition.The substrate temperatures were 400 ℃, 550 ℃ and 700 ℃, respectively.The structures of the films were characterized by X-ray diffraction (XRD) and photoluminescence (PL) And optical properties were investigated.The results of X-ray diffraction show that ZnO films grown at 400 ℃ and 550 ℃ have a high c-axis preferred orientation, but when the substrate temperature is raised to 700 ℃, the films are composed of a single preferred orientation The ZnO thin films grown at 550 ℃ have strong UV emission and narrow FWHM, and the intensity of the ultraviolet light-emitting peak is closely related to the crystalline quality of ZnO thin films Related.