作者发现,负性光刻胶常用的增感剂5-硝基苊,在受紫外光照射后,物理、化学特性有明显的改变。分析表明,5-硝基苊在曝光中产生了光化反应,其主要反应物是8-甲基-4-硝基-1-萘醛(C_(12)H_9NO_3,简称MNNA)。利用5-硝基苊受光照后特性的变化,可在SiO_2层上实现选择刻蚀,并能较满意地解释无显影刻蚀过程。 The authors found that 5-nitroxanthone, a sensitizer commonly used in negative-tone photoresists, significantly changes its physical and chemical properties when irradiated by ultraviolet light. The analysis shows that 5-nitroso has a photochemical reaction during exposure. The main reactant is 8-methyl-4-nitro-1-naphthaldehyde (C 12 H 9 NO 3, MNNA for short). The use of 5-nitro 苊 by the light of the characteristics of the change, the selective etching can be achieved on the SiO_2 layer, and can more satisfactorily explain the non-development of the etching process.