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已设计出一套能使自动对准系统直接与晶片上的图象校准的测试掩模。该技术简化了整个生产线中机器和机器之间相互匹配的自动测量和控制。
A test mask has been devised which enables the automatic alignment system to align directly with the image on the wafer. The technology simplifies automatic measurement and control of machine and machine matching across the entire production line.