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本文对用微波等离子体化学气相沉积方法，以甲烷和氢气的混合气体为原材，在硅或石英玻璃基片上合成类金刚石薄膜进行了研究，并对微波放电合成类金刚石膜的条件进行了考察和探讨。
In this paper, microwave plasma chemical vapor deposition method, a mixed gas of methane and hydrogen as raw material, the synthesis of diamond-like silicon thin films on silicon or quartz glass substrates were studied, and microwave discharge synthesis of diamond-like carbon film conditions were investigated And explore.