论文部分内容阅读
为了系统研究氟掺杂对非晶碳基薄膜摩擦学行为的影响,以C_2H_2和CF_4为气源,通过等离子体增强化学气相沉积方法制备不同F含量的非晶碳基薄膜.采用XPS、SEM、Raman光谱以及纳米压痕等技术测定薄膜的微观结构、化学组成和力学性能,利用球-盘式往复摩擦试验机评价薄膜与不同配副材料的摩擦磨损性能.结果显示:较低F含量并未显著影响薄膜与强碳黏着对偶Ti、WC和Si_3N_4的摩擦系数;少量F原子掺杂明显增加了薄膜与弱碳黏着对偶ZrO_2和Al_2O_3的摩擦系数;薄膜与GCr15对偶的摩擦系数随F含量增加而明显升高;高F含量导致薄膜与Cu对偶的摩擦系数产生明显波动,而导致薄膜与Al对偶的摩擦系数显著增加;值得注意的是,高F含量薄膜在不同体系中都表现出高摩擦低磨损的特点.高活性F原子与对偶材料的摩擦化学作用能够合理解释不同体系摩擦学行为.
In order to systematically study the influence of fluorine doping on the tribological behavior of amorphous carbon films, amorphous carbon films with different F content were prepared by plasma-enhanced chemical vapor deposition using C_2H_2 and CF_4 as gas sources. Raman spectroscopy and nano-indentation techniques were used to determine the microstructure, chemical composition and mechanical properties of the films, and the friction and wear properties of the films and different materials were evaluated by ball-and-disk reciprocating tribometer. The results showed that the lower F content did not The friction coefficients of Ti, WC and Si_3N_4 were significantly affected by the addition of a small amount of F atoms. The friction coefficient of ZrO_2 and Al_2O_3 adhered to the film was significantly increased. The friction coefficient of the film with GCr15 increased with the increase of F content Obviously increased. The high F content caused the significant fluctuation of the friction coefficient between the film and the Cu pair, resulting in a significant increase in the friction coefficient between the film and the Al dual. It is noteworthy that the films with high F content showed high friction in different systems Wear characteristics of high activity F atom and the dual material tribochemical effect can reasonably explain the tribological behavior of different systems.