利用透射电镜研究了铁基体等离子体增强磁控溅射离子镀ＴｉＮ膜的组织和结构．在沉积ＴｉＮ之前先镀一层极薄的钛中间层，继之再沉积ＴｉＮ．研究结果表明：在基体和中间层界面处有ＦｅＴｉ相；在中间层与后继膜的交接处α－Ｔｉ与Ｔｉ＿２Ｎ有结构匹配关系；靠近中间层的后继膜由Ｔｉ＿２Ｎ和ＴｉＮ两相组成；而远离中间层的后继膜部分是ＴｉＮ组成的． The structure and microstructure of the TiN film grown by magnetron sputter ion plating on Fe substrate were investigated by transmission electron microscopy. Prior to the deposition of TiN, a very thin titanium intermediate layer was deposited followed by deposition of TiN. The results show that there is a FeTi phase at the interface between the substrate and the intermediate layer, α-Ti and Ti_2N are structurally matched at the interface between the intermediate layer and the subsequent layer, and the subsequent films near the intermediate layer consist of two phases of Ti_2N and TiN. The successor film portion of the intermediate layer is composed of TiN.