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The behavior of the metallic multilayers of Si/[Fe(10 nm)/Nb(4 nm)/Fe(4 nm)/Nb(4 nm)]2/[Fe(4 nm)/ Nb(4 nm)]4 under 2 MeV Xe-ion irradiation has been investigated by depth profile analysis of Auger electron spectroscopy(AES) and X-ray diffraction.
The behavior of the metallic multilayers of Si / [Fe (10 nm) / Nb (4 nm) / Fe (4 nm) / Nb (4 nm)] 2 / [Fe (4 nm) / Nb under 2 MeV Xe-ion irradiation has been investigated by depth profile analysis of Auger electron spectroscopy (AES) and X-ray diffraction.