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利用表面等离子体共振效应理论及金属-介质复合膜的特殊纳米光学效应对平面多层膜超分辨光刻技术进行了研究.在曝光光源为365 nm的情况下,实现周期230 nm,线宽100 nm的超分辨光刻成像.讨论了均匀金属-介质多层膜的结构参数选择,并通过数值仿真得到有效的光强度和对比度,然后用等离子体纳米光刻进行试验验证,通过最优化选择,最终得到了亚波长结构多层膜的大区域范围超分辨成像.
The planar multi-layer super-resolution photolithography technique was studied by using surface plasmon resonance theory and the special nano-optical effect of the metal-dielectric composite film.When the exposure light source was 365 nm, the periodicity of 230 nm and the linewidth of 100 nm, the structure parameters of the homogeneous metal-dielectric multilayers were discussed and the effective light intensity and contrast were obtained by numerical simulation. Then the experimental results were verified by plasma nano-lithography. By optimizing the selection, Finally, large-area super-resolution imaging of subwavelength structure multilayer films is obtained.