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采用微波等离子体化学气相沉积(MPCVD)技术在钛基片上沉积了掺硼金刚石薄膜,并对掺杂前后的薄膜形貌及结构进行了检测。结果表明掺杂元素对形貌和结构有很大的影响,同时掺杂后薄膜与基底附着力有所下降。掠角衍射(GIXD)检测表明,中间层的主要成分是TiC和TiH2。随着硼的加入,两者的含量增加。薄膜与基底的附着力下降的原因主要是受中间过渡层成分和残余应力增加的共同影响。
Boron doped diamond films were deposited on titanium substrate by microwave plasma chemical vapor deposition (MPCVD) technique. The morphology and structure of the films before and after doping were examined. The results show that the doping elements have a great influence on the morphology and structure, and the adhesion of the film to the substrate decreases after doping. Grazing angle diffraction (GIXD) test showed that the main component of the middle layer is TiC and TiH2. With the addition of boron, the content of both increases. The reason for the decrease of the adhesion between the film and the substrate is mainly due to the influence of the composition of the intermediate layer and the increase of the residual stress.