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金刚石具有诸多优异的物理和化学性质,使得它在许多高新技术领域如:热沉、光学窗口、光导探测器等方面拥有广阔的应用前景。MPCVD法制备金刚石薄膜具有无极放电、沉积温度低等独特优势,是最具潜力制备高质量均匀金刚石薄膜的方法。文章从CH4和H2的浓度和流量,CO2、O2、H2O气体掺杂,微波功率和气压,2.45 GHz和915 MHz两种微波频率、衬底偏压以及衬底位置等方面,综述了不同的沉积参数对金刚石薄膜均匀性的影响。在保证金刚石薄膜质量的前提下,对如何提高金刚石薄膜均匀性进行讨论。结合市场上已经产业化的产品,在适宜的沉积参数和设备条件下可以制备出高质量均匀的金刚石薄膜,并且展望了金刚石薄膜的发展趋势。
Diamond has many excellent physical and chemical properties, making it in many high-tech fields such as: heat sink, optical windows, photoconductive detectors have a broad application prospects. The diamond film prepared by MPCVD has the unique advantages of non-polar discharge and low deposition temperature and is the most promising method for preparing high-quality diamond films. This paper reviews the different depositions of CH4 and H2 from the concentrations and fluxes of CH4 and H2, the doping of CO2, O2 and H2O, the microwave power and pressure, the microwave frequencies of 2.45 GHz and 915 MHz, the substrate bias and the substrate position Effect of Parameters on the Evenness of Diamond Films. On the premise of ensuring the quality of diamond film, how to improve the uniformity of diamond film is discussed. Combined with the industrialized products in the market, diamond films with high quality and uniform distribution can be prepared under suitable deposition parameters and equipment conditions, and the development trend of diamond films is also prospected.