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目前，器件生产厂家和光刻设备制造厂家正在准备进行０．３５μｍ电路的生产。很明显，光学片子步进机仍然是主要的生产设备，但对ｉ线和远紫外片子步进机的选择至今还存在着争议。本文介绍了在开发生产远紫外片子步进机中取得的一些进展。作为１９９０年在ＳＰＩＥ会议上讨论过的采用ＴＴＬ对准系统及自动准分子激光波长控制的早期远紫外片子步进机的替代产品，一种新型的远紫外步进机最近已开发成功。该机采用一种新型的２４８ｎｍ波长的镜头，其像场直径为ф２９．７ｍｍ，数值孔径为０．５。该机主体类似于本公司１９９１年开始生产的宽视场ｉ线步进机，其关键的设计参数和结果本文将给以介绍。其中包括在正性和负性抗蚀剂中０．２５μｍ以下的成像性能和基于ＴＴＬ对准系统原理的高精度套刻，同时给出了与ｉ线步进机混合曝光的匹配性能。
Currently, device manufacturers and lithography equipment manufacturers are preparing 0.35μm circuit production. Obviously, the optical film stepper is still the main production equipment, but the choice of i-line and far-ultraviolet film stepper is still controversial. This article describes some advances made in the development and production of far-ultraviolet film stepper. A new type of far-ultraviolet stepper has been recently developed as an alternative to early far-UV film steppers using the TTL alignment system and auto-excimer laser wavelength control discussed at the SPIE meeting in 1990. The machine uses a new 248nm wavelength lens, the image field diameter ф29.7mm, numerical aperture of 0.5. The main body of the aircraft is similar to the wide field of view i-line stepper produced by our company in 1991, and its key design parameters and results will be introduced in this article. Including the positive and negative resist 0.25μm below the imaging performance and TTL alignment system based on the principle of high-precision engraving, and given i-line stepper mixed exposure matching performance.